TimeDomain CVD, Inc |
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This tutorial seeks to
provide an introduction to the underlying principles of chemical vapor
deposition of films, with examples of films, reactors, and applications.
The emphasis is on microelectronic applications of these techniques, but
the fundamentals of transport, chemistry, and plasma generation are of
course applicable in many circumstances.
The tutorial assumes a general background roughly equivalent to a BS degree in the physical sciences. The aspects of thermodynamics, statistical mechanics, chemistry, and electromagnetism needed for understanding CVD processes are reviewed here, but only in sufficient depth to remind the reader of a past acquaintance with the topics, as in e.g. a college-level course. Some knowledge of the basics of semiconductor manufacturing is also helpful in following the discussion of films and applications. |
Table of Contents |
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The tutorial is a work in progress and useful links, comments, and criticisms are invited. Please direct them to: